Difference between revisions of "Equipment"
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* '''DE-08:''' [[Jupiter II RIE Plasma Etcher | Jupiter II RIE Plasma Etcher]] | * '''DE-08:''' [[Jupiter II RIE Plasma Etcher | Jupiter II RIE Plasma Etcher]] | ||
| − | + | === Vapor/Wet Etch === | |
* '''DE-06:''' [[SPTS/Xactix XeF2 Isotropic Etcher | SPTS/Xactix XeF2 Isotropic Etcher]] | * '''DE-06:''' [[SPTS/Xactix XeF2 Isotropic Etcher | SPTS/Xactix XeF2 Isotropic Etcher]] | ||
== Lithography == | == Lithography == | ||
| − | + | === E-beam Lithography === | |
* '''EBL-01:''' [[ Elionix ELS-7500EX E-Beam Lithography System | Elionix ELS-7500EX E-Beam Lithography System ]] | * '''EBL-01:''' [[ Elionix ELS-7500EX E-Beam Lithography System | Elionix ELS-7500EX E-Beam Lithography System ]] | ||
* '''EBL-02:''' [[Litho Workstation for BEAMER and TRACER | Litho Workstation for BEAMER and TRACER]] | * '''EBL-02:''' [[Litho Workstation for BEAMER and TRACER | Litho Workstation for BEAMER and TRACER]] | ||
| − | + | === Laser Lithography === | |
* '''LW-01:''' [[Heidelberg DWL 66+ Laser Writer | Heidelberg DWL 66+ Laser Writer]] | * '''LW-01:''' [[Heidelberg DWL 66+ Laser Writer | Heidelberg DWL 66+ Laser Writer]] | ||
* '''LW-02:''' [[Nanoscribe Photonic Professional GT | Nanoscribe Photonic Professional GT]] | * '''LW-02:''' [[Nanoscribe Photonic Professional GT | Nanoscribe Photonic Professional GT]] | ||
| − | + | === Photolithography === | |
* '''MA-01:''' [[SUSS MicroTec MA6 Gen3 Mask Aligner | SUSS MicroTec MA6 Gen3 Mask Aligner]] | * '''MA-01:''' [[SUSS MicroTec MA6 Gen3 Mask Aligner | SUSS MicroTec MA6 Gen3 Mask Aligner]] | ||
| − | + | === Imprint Lithography === | |
* '''MA-02:''' [[Nanonex NX2600 Nanoimprint | Nanonex NX2600 Nanoimprint]] | * '''MA-02:''' [[Nanonex NX2600 Nanoimprint | Nanonex NX2600 Nanoimprint]] | ||
| − | + | === Resist Coating === | |
* '''RC-01:''' [[SUSS MicroTec AS8 AltaSpray | SUSS MicroTec AS8 AltaSpray]] | * '''RC-01:''' [[SUSS MicroTec AS8 AltaSpray | SUSS MicroTec AS8 AltaSpray]] | ||
| − | * '''SPN-01:''' Spinner - Positive Resist (Left) - | + | * '''SPN-01:''' [[Spinner - Positive Resist (Left) - POLOS | Spinner - Positive Resist (Left) - Polos]] |
| − | * '''SPN-03:''' Spinner - Positive Resist (Right) | + | * '''SPN-03:''' Spinner - Positive Resist (Right) |
* '''SPN-04:''' Spinner - Negative Resist (Left) | * '''SPN-04:''' Spinner - Negative Resist (Left) | ||
* '''SPN-05:''' Spinner - Negative Resist (Right) | * '''SPN-05:''' Spinner - Negative Resist (Right) | ||
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* '''PVD-07:''' [[SCS PDS2010 Parylene Coater| SCS PDS2010 Parylene Coater]] | * '''PVD-07:''' [[SCS PDS2010 Parylene Coater| SCS PDS2010 Parylene Coater]] | ||
* Silanization Dessicator | * Silanization Dessicator | ||
| − | * '''SPN-07:''' Spinner - SU-8/PDMS | + | * '''SPN-07:''' [[Spinner - SU-8/PDMS | Spinner - SU-8/PDMS]] |
== Metrology & characterization == | == Metrology & characterization == | ||
| + | === Stylus profilometers === | ||
* '''MET-01:''' [[KLA Tencor P7 2D profilometer | KLA Tencor P7 2D profilometer]] | * '''MET-01:''' [[KLA Tencor P7 2D profilometer | KLA Tencor P7 2D profilometer]] | ||
* '''MET-02:''' [[KLA Tencor P7 2D&3D/stress profilometer | KLA Tencor P7 2D&3D/stress profilometer]] | * '''MET-02:''' [[KLA Tencor P7 2D&3D/stress profilometer | KLA Tencor P7 2D&3D/stress profilometer]] | ||
| + | |||
| + | === Optical profilometers === | ||
* '''MET-03:''' [[Filmetrics F50 (UV Filter) | Filmetrics F50 (UV Filter)]] | * '''MET-03:''' [[Filmetrics F50 (UV Filter) | Filmetrics F50 (UV Filter)]] | ||
* '''MET-04:''' [[Filmetrics F40 | Filmetrics F40]] | * '''MET-04:''' [[Filmetrics F40 | Filmetrics F40]] | ||
* '''MET-11:''' [[Filmetrics F50 (White Light) | Filmetrics F50 (White Light)]] | * '''MET-11:''' [[Filmetrics F50 (White Light) | Filmetrics F50 (White Light)]] | ||
| − | * '''MET-05:''' [[Zygo NewView 7300 Optical Profilometer | Zygo NewView 7300 Optical Profilometer]] | + | * '''MET-05:''' [[Zygo NewView 7300 Optical Profilometer | Zygo NewView 7300 Optical Profilometer]] |
| + | |||
| + | === Ellipsometer === | ||
* '''MET-06:''' [[Woollam V-VASE Ellipsometer | Woollam V-VASE Ellipsometer]] | * '''MET-06:''' [[Woollam V-VASE Ellipsometer | Woollam V-VASE Ellipsometer]] | ||
| + | |||
| + | === Electrical characterization === | ||
* '''MET-08:''' [[Jandel Multi Height Four Point Probe | Jandel Multi Height Four Point Probe]] | * '''MET-08:''' [[Jandel Multi Height Four Point Probe | Jandel Multi Height Four Point Probe]] | ||
* '''MET-09:''' Micromanipulator 4060 Probe Station | * '''MET-09:''' Micromanipulator 4060 Probe Station | ||
| + | |||
| + | === Microscopes === | ||
* '''MET-10:''' Zeiss Smartzoom5 2D/3D Optical Microscope | * '''MET-10:''' Zeiss Smartzoom5 2D/3D Optical Microscope | ||
* '''MET-12:''' [[Zeiss Axio Imager M2m Microscopes | Zeiss Axio Imager M2m Microscopes]] (1/4) | * '''MET-12:''' [[Zeiss Axio Imager M2m Microscopes | Zeiss Axio Imager M2m Microscopes]] (1/4) | ||
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* '''BE-03:''' [[K&S Wire Bonder | K&S Wire Bonder]] | * '''BE-03:''' [[K&S Wire Bonder | K&S Wire Bonder]] | ||
* '''BE-04:''' [[ADT 7100 Dicing Saw | ADT 7100 Dicing Saw]] | * '''BE-04:''' [[ADT 7100 Dicing Saw | ADT 7100 Dicing Saw]] | ||
| + | * '''BE-06:''' [[TPT HB100 Wire Bonder | TPT HB100 Wire Bonder]] | ||
* '''CPD-01:''' [[Tousimis Critical Point Dryer | Tousimis Critical Point Dryer]] | * '''CPD-01:''' [[Tousimis Critical Point Dryer | Tousimis Critical Point Dryer]] | ||
* Dimatix ink-Jet Printer | * Dimatix ink-Jet Printer | ||
Revision as of 12:53, 8 November 2022
Physical Vapor Deposition (PVD)
Evaporation
- PVD-01: Lesker Nano-36 Thermal Evaporator
- PVD-02: Lesker PVD75 E-Beam/Thermal Evaporator
- PVD-04: Lesker PVD75 E-beam Evaporator
Sputtering
- PVD-03: Lesker PVD75 DC/RF Sputterer
- PVD-05: Denton Explorer14 Magnetron Sputterer
PVD-07 is listed under Soft Lithography
Chemical Vapor Deposition (CVD)
Atomic layer deposition (ALD)
- ALD-01: Cambridge Nanotech S200 ALD
- ALD-03: Veeco Savannah 200
Plasma Enhanced CVD (PECVD)
- CVD-01: Oxford PlasmaLab 100 PECVD
Tube furnace
Etching
Plasma Etch
- DE-02: Anatech SCE-108 Barrel Asher
- DE-03: SPTS Si DRIE
- DE-04: Oxford 80 Plus RIE
- DE-05: Oxford Cobra ICP Etcher
- DE-08: Jupiter II RIE Plasma Etcher
Vapor/Wet Etch
Lithography
E-beam Lithography
- EBL-01: Elionix ELS-7500EX E-Beam Lithography System
- EBL-02: Litho Workstation for BEAMER and TRACER
Laser Lithography
Photolithography
Imprint Lithography
- MA-02: Nanonex NX2600 Nanoimprint
Resist Coating
- RC-01: SUSS MicroTec AS8 AltaSpray
- SPN-01: Spinner - Positive Resist (Left) - Polos
- SPN-03: Spinner - Positive Resist (Right)
- SPN-04: Spinner - Negative Resist (Left)
- SPN-05: Spinner - Negative Resist (Right)
- SPN-06: Spinner - E-Beam Resist Only
SPN-07 is listed under Soft Lithography
Soft Lithography
- SCE-106: Anatech SCE-106 Barrel Asher
- MA-03: ABM3000HR Mask Aligner
- PVD-07: SCS PDS2010 Parylene Coater
- Silanization Dessicator
- SPN-07: Spinner - SU-8/PDMS
Metrology & characterization
Stylus profilometers
- MET-01: KLA Tencor P7 2D profilometer
- MET-02: KLA Tencor P7 2D&3D/stress profilometer
Optical profilometers
- MET-03: Filmetrics F50 (UV Filter)
- MET-04: Filmetrics F40
- MET-11: Filmetrics F50 (White Light)
- MET-05: Zygo NewView 7300 Optical Profilometer
Ellipsometer
- MET-06: Woollam V-VASE Ellipsometer
Electrical characterization
- MET-08: Jandel Multi Height Four Point Probe
- MET-09: Micromanipulator 4060 Probe Station
Microscopes
- MET-10: Zeiss Smartzoom5 2D/3D Optical Microscope
- MET-12: Zeiss Axio Imager M2m Microscopes (1/4)
- MET-13: Zeiss Axio Imager M2m Microscopes (2/4)
- MET-14: Zeiss Axio Imager M2m Microscopes (3/4)
- MET-15: Zeiss Axio Imager M2m Microscopes (4/4)
Backend & Packaging
- LMM-01: IPG IX-255 Excimer Micromachining Laser
- LMM-02: IPG IX280-DXF Green Micromachining Laser
- BE-01: EVG 510 Wafer Bonder
- BE-02: EVG 620 Wafer Bond Aligner
- BE-03: K&S Wire Bonder
- BE-04: ADT 7100 Dicing Saw
- BE-06: TPT HB100 Wire Bonder
- CPD-01: Tousimis Critical Point Dryer
- Dimatix ink-Jet Printer