Difference between revisions of "Jupiter II RIE Plasma Etcher"
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m (Changed protection level for "Jupiter II RIE Plasma Etcher" ([Edit=Allow only autoconfirmed users] (indefinite) [Move=Allow only autoconfirmed users] (indefinite))) |
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| imagecaption = | | imagecaption = | ||
| Instrument_Type = Etch | | Instrument_Type = Etch | ||
| − | | Staff_Manager = | + | | Staff_Manager = [[Kyle Keenan | Kyle Keenan]] |
| Lab_Location = Bay 2 | | Lab_Location = Bay 2 | ||
| Tool_Manufacturer = March | | Tool_Manufacturer = March | ||
| Tool_Model = Jupiter II | | Tool_Model = Jupiter II | ||
| − | | | + | | NEMO_Designation = DE-08 |
| − | | Lab_Phone = | + | | Lab_Phone = 215-898-9748 |
| SOP Link = [https://www.seas.upenn.edu/~nanosop/JupiterII.htm SOP] | | SOP Link = [https://www.seas.upenn.edu/~nanosop/JupiterII.htm SOP] | ||
}} | }} | ||
Latest revision as of 13:09, 3 January 2024
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| Tool Name | Jupiter II RIE Plasma Etcher |
|---|---|
| Instrument Type | Etch |
| Staff Manager | Kyle Keenan |
| Lab Location | Bay 2 |
| Tool Manufacturer | March |
| Tool Model | Jupiter II |
| NEMO Designation | DE-08 |
| Lab Phone | 215-898-9748 |
| SOP Link | SOP |
Description
The March Jupiter II is a reactive ion etcher configured with O2 gas. The system is typically used as a plasma asher/cleaner.
Applications
- Removal of photoresist
- Removal of organic materials